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Vivek G Badami

from Higganum, CT
Age ~52

Vivek Badami Phones & Addresses

  • 18 Teaberry Ct, Higganum, CT 06441 (860) 345-8201
  • Pittsford, NY
  • 9329 Old Concord Rd, Charlotte, NC 28213 (704) 548-1265
  • 60 Whitney Ridge Rd, Fairport, NY 14450
  • 18 Teaberry Ct, Higganum, CT 06441

Work

Position: Craftsman/Blue Collar

Education

Degree: High school graduate or higher

Publications

Us Patents

Device For High-Accuracy Measurement Of Dimensional Changes

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US Patent:
7239397, Jul 3, 2007
Filed:
Jul 27, 2004
Appl. No.:
10/900484
Inventors:
Vivek G. Badami - Pittsford NY,
Steven R. Patterson - Livermore CA,
Assignee:
Corning Incorporated - Corning NY
International Classification:
G01B 9/02
US Classification:
356503, 356485, 356492
Abstract:
Thermal expansion characteristics of test materials of ultra-low thermal expansion material are measured with a test beam that is split into a test material-measuring portion and an instrument-measuring portion. Both measuring portions propagate through common portions of a test arm. The test material-measuring portion encounters a test material, but the instrument-measuring portion does not. Thermal expansion characteristics of the test material are measured to high accuracy by manipulating the measures to distinguish displacements associated with the test material from displacements associated with the instrument structure.

Optically Balanced Instrument For High Accuracy Measurement Of Dimensional Change

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US Patent:
7426039, Sep 16, 2008
Filed:
Jan 23, 2006
Appl. No.:
11/338127
Inventors:
Vivek G Badami - Pittsford NY,
Steven R Patterson - Livermore CA,
Assignee:
Corning Incorporated - Corning NY
International Classification:
G01B 9/02
US Classification:
356503
Abstract:
An instrument for measuring dimensional changes in materials, such as ultra-low thermal expansion materials, contains an optically balanced measuring loop. Both an object beam and a loop beam propagate around the measuring loop. The object beam encounters both opposite side surfaces of the test object and the loop beam encounters remaining components of the measuring loop in common with the object beam. The object and loop beams can be separately compared to reference beams for producing heterodyne signal beams.

Measurement Of Changes In Surfaces Of Objects

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US Patent:
8456644, Jun 4, 2013
Filed:
Sep 2, 2010
Appl. No.:
12/874570
Inventors:
Christopher J. Evans - Concord NC,
John Filhaber - East Haddam CT,
Vivek G. Badami - Higganum CT,
Jan Liesener - Middletown CT,
Assignee:
Zygo Corporation - Middlefield CT
International Classification:
G01B 11/02
US Classification:
356513
Abstract:
Deformations of a surface of a test object can be measured by attaching mirrors to a surface of a test object, each mirror having a reflective surface with a dimension and a radius of curvature smaller than those of the surface of the test object. Light is directed towards the mirrors and a reference surface, and interference patterns are generated using light reflected from the mirrors and the reference surface. Changes in the surface of the test object are determined based on the interference patterns.

Optically Balanced Instrument For High Accuracy Measurement Of Dimensional Change

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US Patent:
20060279740, Dec 14, 2006
Filed:
Aug 18, 2006
Appl. No.:
11/506380
Inventors:
Vivek Badami - Pittsford NY,
Steven Patterson - Livermore CA,
International Classification:
G01B 9/02
G01B 11/02
US Classification:
356485000, 356496000
Abstract:
An instrument for measuring dimensional changes in materials, such as ultra-low thermal expansion materials, contains an optically balanced measuring loop. Both an object beam and a loop beam propagate around the measuring loop. The object beam encounters both opposite side surfaces of the test object and the loop beam encounters remaining components of the measuring loop in common with the object beam. The object and loop beams can be separately compared to reference beams for producing heterodyne signal beams.

Thermally Stable Optical Sensor Mount

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US Patent:
20130128254, May 23, 2013
Filed:
Nov 8, 2012
Appl. No.:
13/672544
Inventors:
Vivek G. Badami - Higganum CT,
Assignee:
ZYGO CORPORATION - Middlefield CT
International Classification:
G01B 11/14
G03F 7/20
US Classification:
355 72, 356617
Abstract:
Disclosed is an apparatus including a mechanical reference frame and a rigid object mechanically coupled to the reference frame by two or more constraints. The stiffnesses of at least two of the constraints are different from one another, and the relative locations and stiffnesses of the constraints cause a designated point on the rigid object to remain stationary with respect to the reference frame during thermal expansion of the rigid object over a range of temperatures.

Interferometry System Having Reduced Cyclic Errors

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US Patent:
61814202, Jan 30, 2001
Filed:
Oct 6, 1998
Appl. No.:
9/168200
Inventors:
Vivek G. Badami - Charlotte NC
Steven R. Patterson - Concord NC
Carl A. Zanoni - Middlefield CT
Assignee:
Zygo Corporation - Middlefield CT
University of North Carolina at Charlotte - Charlotte NC
International Classification:
G01B 902
US Classification:
356349
Abstract:
The invention features a phase measurement system for minimizing cyclic errors in a relative phase between exit reference and measurement beams emerging from an interferometer. The phase measurement system includes: a first optical processing channel including a first polarizer and a first detector, wherein during operation a first portion of the exit reference and measurement beams pass through the first polarizer to produce a first mixed beam and wherein the first detector measures an intensity of the first mixed beam; a second optical processing channel including a quarter wave retarder, a second polarizer, and a second detector, wherein during operation a second portion of the exit reference and measurement beams passes through the retarder and then the second polarizer to produce a second mixed beam and wherein the second detector measures an intensity of the second mixed beam; and a signal processor which during operation receives signals from the first and second detectors indicative of the intensities of the first and second mixed beams and processes the signals to determine, and minimize cyclic errors in, the relative phase between the exit reference and measurement beams. The invention also features interferometry, lithography, and beam writing systems that include the phase measurement system to improve the accuracy of interferometric distance measurements.
Vivek G Badami from Higganum, CT, age ~52 Get Report