20040265733, Dec 30, 2004
Francis Houlihan - Millington NJ,
Medhat Toukhy - Flemington NJ,
Salem Mullen - Hackettstown NJ,
430/270100, 430/322000, 430/330000
A composition useful for forming a photoresist layer at i-line (365 nm) comprising (a) a film forming resin; (b) a compound represented by the following formula
wherein Ris a Calkyl group, Caryl group, or Caralkyl group, the Calkyl group, Caryl group, or Caralkyl group being unsubstituted or substituted by one or more groups selected from halogen, Calkyl, Cperfluoroalkyl, Calkoxy, cyano, hydroxyl, or nitro; Rand Rare each independently selected from hydrogen, Calkyl, Cperfluoroalkyl, Calkoxy, nitro, halogen, carboxyl, hydroxyl, and sulfate; each of m and n are independently 0 or a positive integer; and X is a non-nucleophilic anion of an acid; (c) optionally, additives to adjust the optical, mechanical and film forming properties; (d) optionally, a base or radiation sensitive base; and (e) a solvent.