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Salem Mullen Phones & Addresses

  • 11 Birch Ln, Florham Park, NJ 07932 (973) 377-7707
  • Morristown, NJ
  • Hackettstown, NJ
  • Bridgewater, NJ
  • Penns Grove, NJ

Publications

Us Patents

Antireflective Coating Compositions

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US Patent:
8221965, Jul 17, 2012
Filed:
Jul 8, 2008
Appl. No.:
12/133562
Inventors:
Huirong Yao - Plainsboro NJ,
Zhong Xiang - Orlando FL,
Jianhui Shan - Pennington NJ,
Salem Mullen - Florham Park NJ,
Hengpeng Wu - Hillsborough NJ,
Assignee:
AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:
G03F 1/58
G03F 7/20
C08G 69/00
US Classification:
430325, 430326, 4302721, 4302711, 430312, 528289, 528288, 528 69, 528361
Abstract:
Antireflective coating compositions and related polymers are disclosed.

Antireflective Compositions And Methods Of Using Same

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US Patent:
8507192, Aug 13, 2013
Filed:
Feb 18, 2010
Appl. No.:
12/708205
Inventors:
Huirong Yao - Plainsboro NJ,
Guanyang Lin - Whitehouse Station NJ,
Jianhui Shan - Pennington NJ,
JoonYeon Cho - Bridgewater NJ,
Salem K. Mullen - Florham Park NJ,
Assignee:
AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:
G03F 7/40
G03F 7/11
G03F 7/38
US Classification:
430325, 430326, 4302711, 438952, 525417
Abstract:
A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer,.

Photoacid Generators

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US Patent:
20040265733, Dec 30, 2004
Filed:
Jun 30, 2003
Appl. No.:
10/609735
Inventors:
Francis Houlihan - Millington NJ,
Medhat Toukhy - Flemington NJ,
Salem Mullen - Hackettstown NJ,
International Classification:
G03F007/004
US Classification:
430/270100, 430/322000, 430/330000
Abstract:
A composition useful for forming a photoresist layer at i-line (365 nm) comprising (a) a film forming resin; (b) a compound represented by the following formula wherein Ris a Calkyl group, Caryl group, or Caralkyl group, the Calkyl group, Caryl group, or Caralkyl group being unsubstituted or substituted by one or more groups selected from halogen, Calkyl, Cperfluoroalkyl, Calkoxy, cyano, hydroxyl, or nitro; Rand Rare each independently selected from hydrogen, Calkyl, Cperfluoroalkyl, Calkoxy, nitro, halogen, carboxyl, hydroxyl, and sulfate; each of m and n are independently 0 or a positive integer; and X is a non-nucleophilic anion of an acid; (c) optionally, additives to adjust the optical, mechanical and film forming properties; (d) optionally, a base or radiation sensitive base; and (e) a solvent.

Photoresist Composition For Imaging Thick Films

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US Patent:
20070015080, Jan 18, 2007
Filed:
Jul 12, 2005
Appl. No.:
11/179364
Inventors:
Medhat Toukhy - Flemington NJ,
Ping-Hung Lu - Bridgewater NJ,
Salem Mullen - Hackettstown NJ,
International Classification:
G03C 1/00
US Classification:
430270100
Abstract:
The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for a process for imaging the photoresist of the present invention, especially where the thickness of the photoresist is up to 200 microns and where the process comprises a single exposure step.

Developable Undercoating Composition For Thick Photoresist Layers

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US Patent:
20070105040, May 10, 2007
Filed:
Nov 10, 2005
Appl. No.:
11/271775
Inventors:
Medhat Toukhy - Flemington NJ,
Joseph Oberlander - Phillipsburg NJ,
Salem Mullen - Hackettstown NJ,
International Classification:
G03C 1/00
US Classification:
430270100
Abstract:
The present invention relates to an undercoating composition for a photoresist comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, and a photoacid generator which produces a strong acid upon exposure to radiation, and further where the polymer is transparent at the exposure radiation. The invention also relates to a process for imaging the undercoating composition.

Dual Damascene Via Filling Composition

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US Patent:
20100015550, Jan 21, 2010
Filed:
Jul 17, 2008
Appl. No.:
12/174718
Inventors:
Weihong Liu - Bridgewater NJ,
Guanyang Lin - Whitehouse Station NJ,
Salem K. Mullen - Florham Park NJ,
Jian Yin - Bridgewater NJ,
Mark Neisser - Whitehouse Station NJ,
International Classification:
G03F 7/20
G03F 7/004
US Classification:
4302801, 4302701, 430319
Abstract:
Compositions for use in dual damascene process are disclosed.

Bottom Antireflective Coating Compositions

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US Patent:
20100092894, Apr 15, 2010
Filed:
Oct 14, 2008
Appl. No.:
12/250563
Inventors:
Weihong Liu - Bridgewater NJ,
Guanyang Lin - Whitehouse Station NJ,
Joon Yeon Cho - Bridgewater NJ,
Jian Yin - Bridgewater NJ,
Salem K. Mullen - Florham Park NJ,
Mark Neisser - Whitehouse Station NJ,
International Classification:
G03F 7/20
C07D 251/32
C09D 5/00
US Classification:
430325, 544192, 10628721
Abstract:
Antireflective coating compositions are discussed.

Bottom Antireflective Coating Compositions

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US Patent:
20110250544, Oct 13, 2011
Filed:
Jun 16, 2011
Appl. No.:
13/162065
Inventors:
Weihong Liu - Bridgewater NJ,
Guanyang Lin - Whitehouse Station NJ,
JoonYeon Cho - Bridgewater NJ,
Jian Yin - Bridgewater NJ,
Salem K. Mullen - Florham Park NJ,
Mark Neisser - Whitehouse Station NJ,
Assignee:
AZ ELECTRONIC MATERIALS USA CORP. - SOMERVILLE NJ
International Classification:
G03F 7/20
C07D 251/04
C09D 5/00
US Classification:
430325, 252582, 544221
Abstract:
Antireflective coating compositions are discussed.
Salem K Mullen from Florham Park, NJ, age ~49 Get Report